Tae Joo Park*, Prasanna
Sivasubramani, Robert M. Wallace, and Jiyoung Kim*
“Effects of growth
temperature and oxidant feeding time on residual C and N-related impurities and
Si in-diffusion behavior in atomic-layer-deposited La2O3
thin films”
Appl. Surf. Sci., 292, 880–885 (2014) - Feb. *Corresponding author (IF=4.439)