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Tae Joo Park*, Prasanna Sivasubramani, Robert M. Wallace, and Jiyoung Kim* “Effects of growth temperature and oxidant feeding time on residual C and N-related impurities and Si in-diffusion behavior in atomic-layer-deposited La2O3 thin films” Appl. S…
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   https://doi.org/10.1016/j.apsusc.2013.12.072 [924]
Tae Joo Park*, Prasanna Sivasubramani, Robert M. Wallace, and Jiyoung Kim* 

Effects of growth temperature and oxidant feeding time on residual C and N-related impurities and Si in-diffusion behavior in atomic-layer-deposited La2O3 thin films”

Appl. Surf. Sci., 292, 880–885 (2014) - Feb.   *Corresponding author       (IF=4.439)