Jeong Hwan Kim, Tae Joo Park*, Seong Keun Kim, Jae Hyuck Jang, Un Ki Kim, Hyung Suk Jung, Sang Young Lee, and Cheol Seong Hwang*
“Chemical Structures and Electrical Properties of Atomic layer deposited HfO2 Thin Films Grown at an Extremely Low Temperature (≤100oC) Using O3 as an Oxygen Source”
Appl. Surf. Sci., 292, 852–856 (2014) - Feb. *Corresponding author (IF=4.439)