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Jeong Hwan Kim, Tae Joo Park*, Seong Keun Kim, Jae Hyuck Jang, Un Ki Kim, Hyung Suk Jung, Sang Young Lee, and Cheol Seong Hwang* “Chemical Structures and Electrical Properties of Atomic layer deposited HfO2 Thin Films Grown at an Extremely Low Tempe
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   https://doi.org/10.1016/j.apsusc.2013.12.061 [769]
Jeong Hwan Kim, Tae Joo Park*, Seong Keun Kim, Jae Hyuck Jang, Un Ki Kim, Hyung Suk Jung, Sang Young Lee, and Cheol Seong Hwang*

 “Chemical Structures and Electrical Properties of Atomic layer deposited HfO2 Thin Films Grown at an Extremely Low Temperature (≤100oC) Using O3 as an Oxygen Source”

Appl. Surf. Sci., 292, 852–856 (2014) - Feb.   *Corresponding author       (IF=4.439)