Hyo Kyeom Kim, Il-Hyuk Yu, Jae Ho Lee, Tae Joo Park, and Cheol Seong Hwang, “Scaling of Equivalent Oxide Thickness of Atomic Layer Deposited HfO2 Film Using RuO2 Electrodes Suppressing the Dielectric Deal-Layer Effect”, Appl. Phys. Lett. 101, 172910 (…