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작성일 : 12-09-12 19:21
Hyung-Suk Jung, Il-Hyuk Yu, Hyo Kyeom Kim, Sang Young Lee, Joohwi Lee, Yujin Choi, Yoon Jang Chung, Nae-In Lee, Tae Joo Park, Jung-Hae Choi, and Cheol Seong Hwang "Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Va
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   IEEE transactions on electron devices, vol.59, no.9 sep. 2012.pdf (729.3K) [29] DATE : 2012-09-12 19:21:23
Hyung-Suk Jung, Il-Hyuk Yu, Hyo Kyeom Kim, Sang Young Lee, Joohwi Lee, Yujin Choi, Yoon Jang Chung, Nae-In Lee, Tae Joo Park, Jung-Hae Choi, and Cheol Seong Hwang
 
"Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial Layers."
 
IEEE Trans. Electron. Dev., 59(9), 2350-2356 (2012) - Sep.       (IF=2.620)