Hyung-Suk Jung, Hyo Kyeom Kim, Il-Hyuk Yu, Sang Young Lee, Joohwi Lee, Jinho Park, Jae Hyuck Jang, Sang-Ho Jeon, Yoon Jang Chung, Deok-Yong Cho, Nae-In Lee, Tae Joo Park, Jung-Hae Choi, and Cheol Seong Hwang “Properties of atomic layer deposited HfO2 fi
Hyung-Suk Jung, Hyo Kyeom Kim, Il-Hyuk Yu, Sang Young Lee, Joohwi Lee, Jinho Park, Jae Hyuck Jang, Sang-Ho Jeon, Yoon Jang Chung, Deok-Yong Cho, Nae-In Lee, Tae Joo Park, Jung-Hae Choi, and Cheol Seong Hwang
“Properties of atomic layer deposited HfO2 films on Ge substrates depending on process temperature”
J. Electrochem. Soc., 159(4), G33-G39 (2012) - Feb. (IF=3.662)
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