Bhaswar Chakrabarti, Hee Soo Kang, Barry Brennan, Tae Joo Park, Kurtis D. Cantley, Adam Pirkle, Stephen McDonnell, Jiyoung Kim, Robert M. Wallace and Eric M. Vogel
“Investigation of tunneling current in SiO2/HfO2 gate stacks for flash memory applications”
IEEE Trans. Electron. Dev., 58, 4189 (2011) - Dec. (IF=2.620)