Hyo Kyeom Kim, Hyung-Suk Jung, Jae Hyuck Jang, Sang Young Lee, Tae Joo Park, Seok Hee Lee, and Cheol Seong Hwang
“Dependence of optimized annealing temperature for tetragonal phase formation on the Si concentration of atomic-layer-deposited Hf-silicate film”
J. Appl. Phys. 110, 114107 (2011) (IF=2.176)