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작성일 : 12-05-15 20:12
Bongki Lee, Arabhi Hande, Tae Joo Park, Keum Jee Chung, Jinho Ahn, Mike Rousseau, Daewon Hong, Huazhi Li, Xinye Liu, Deo Shenai, and Jiyoung Kim “Atomic-layer-deposition of LaHfOx Nano-laminates for High- k Gate Dielectric Applications” Microelectron.…
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   ALD of LaHfOx nano-laminates for high-κ gate dielectric applications.pdf (677.7K) [22] DATE : 2012-05-22 20:30:33
Bongki Lee, Arabhi Hande, Tae Joo Park, Keum Jee Chung, Jinho Ahn, Mike Rousseau, Daewon Hong, Huazhi Li, Xinye Liu, Deo Shenai, and Jiyoung Kim
 
“Atomic-layer-deposition of LaHfOx Nano-laminates for High- k Gate Dielectric Applications”
 
Microelectron. Eng. 88, 3385-3388 (2011) - Dec.       (IF=2.020)