Tae Joo Park, Prasanna Sivasubramani, Brian E. Coss, Bongki Lee, Robert M. Wallace, Jiyoung Kim, Mike Rousseau, Xinye Liu, Huazhi Li, Jean-Sebastien Lehn, Daewon Hong, and Deo Shenai “Reduction of residual carbon and nitrogen-related impurities by Al2O3
Tae Joo Park, Prasanna Sivasubramani, Brian E. Coss, Bongki Lee, Robert M. Wallace, Jiyoung Kim, Mike Rousseau, Xinye Liu, Huazhi Li, Jean-Sebastien Lehn, Daewon Hong, and Deo Shenai
“Reduction of residual carbon and nitrogen-related impurities by Al2O3 insertion into atomic-layer-deposited La2O3 thin films”
Electrochem. Solid Stat. Lett. 14(5), G23-G26 (2011) - Mar. (IF=2.321)
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