Tae Joo Park, Prasanna Sivasubramani, Brian E. Coss, Hyun-Chul Kim, Bongki Lee, Robert M. Wallace, Jiyoung Kim, Mike Rousseau, Xinye Liu, Huazhi Li, Jean-Sebastien Lehn, Daewon Hong, and Deo Shenai
“Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in-situ x-ray photoelectron spectroscopy”
Appl. Phys. Lett., 97, 092904 (2010) - Aug. (IF=3.495)