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작성일 : 12-05-15 20:11
Tae Joo Park, Prasanna Sivasubramani, Brian E. Coss, Hyun-Chul Kim, Bongki Lee, Robert M. Wallace, Jiyoung Kim, Mike Rousseau, Xinye Liu, Huazhi Li, Jean-Sebastien Lehn, Daewon Hong, and Deo Shenai, “Effects of O3 and H2O oxidants on C and N-related imp
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   Effects of O3 and H2O oxidants on C and N related impurities in ALD La2O3.pdf (907.4K) [25] DATE : 2012-05-22 20:34:45
Tae Joo Park, Prasanna Sivasubramani, Brian E. Coss, Hyun-Chul Kim, Bongki Lee, Robert M. Wallace, Jiyoung Kim, Mike Rousseau, Xinye Liu, Huazhi Li, Jean-Sebastien Lehn, Daewon Hong, and Deo Shenai
 
“Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in-situ x-ray photoelectron spectroscopy”
 
Appl. Phys. Lett., 97, 092904 (2010) - Aug.       (IF=3.495)