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작성일 : 12-05-15 20:10
Tae Joo Park, Keum Jee Chung, Hyun Chul Kim, Jinho Ahn, Robert M. Wallace, and Jiyoung Kim “Reduced metal contamination in atomic-layer-deposited high-k films grown using O3 oxidant generated without N2 assistance” Electrochem. Solid Stat. Lett., 13(…
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   Reduced Metal Contamination in Atomic-Layer-Deposited.pdf (534.0K) [30] DATE : 2012-05-22 20:37:19
Tae Joo Park, Keum Jee Chung, Hyun Chul Kim, Jinho Ahn, Robert M. Wallace, and Jiyoung Kim
 
“Reduced metal contamination in atomic-layer-deposited high-k films grown using O3 oxidant generated without N2 assistance”
 
Electrochem. Solid Stat. Lett., 13(8), G65-G67 (2010) - May.          (IF=2.321)