Tae Joo Park, Keum Jee Chung, Hyun Chul Kim, Jinho Ahn, Robert M. Wallace, and Jiyoung Kim
“Reduced metal contamination in atomic-layer-deposited high-k films grown using O3 oxidant generated without N2 assistance”
Electrochem. Solid Stat. Lett., 13(8), G65-G67 (2010) - May. (IF=2.321)