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작성일 : 12-05-15 20:09
Jeong Hwan Kim, Tae Joo Park, Moomju Cho, Jae Huck Jang, Minha Seo, Kwang Duk Na, Cheol Seong Hwang, and Jeong Yeon Won “Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO2 Dielectric Films by In Situ NH3 Injection” J. E…
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   Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO2 Dielectric Films by In Situ NH3 Injection.pdf (689.8K) [17] DATE : 2012-05-22 20:45:56
Jeong Hwan Kim, Tae Joo Park, Moomju Cho, Jae Huck Jang, Minha Seo, Kwang Duk Na, Cheol Seong Hwang, and Jeong Yeon Won
 
“Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO2 Dielectric Films by In Situ NH3 Injection”
 
J. Electrochem. Soc., 156(5), G48-G52 (2009) - Mar.       (IF=3.662)