Jae Hyuck Jang, Tae Joo Park, Jeong Hwan Kim, Kwang Duk Na, Woo Young Park, Miyoung Kim, and Cheol Seong Hwang,
“Role of Carbon on Resistivity and Structure of HfCxNy Films Grown by Low Temperature MOCVD”
J. Electrochem. Soc., 156(1), H76-H79 (2008) - Nov. (IF=3.662)