HOME > Publication > Papers

 
작성일 : 12-05-15 20:09
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Jiyoung Jang and Cheol Seong Hwang, “Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si conc
 글쓴이 : 최고관리자
조회 : 942  
   Dependences of nitrogen incorporation behaviors on the crystallinity.pdf (1.1M) [16] DATE : 2012-05-22 20:48:51
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Jiyoung Jang and Cheol Seong Hwang
 
“Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si concentrations”
 
J. Appl. Phys., 104, 054101 (2008) - Sep.       (IF=2.176)