Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Jiyoung Jang and Cheol Seong Hwang
“Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si concentrations”
J. Appl. Phys., 104, 054101 (2008) - Sep. (IF=2.176)