Jiyoung Jang, Tae Joo Park, Jihwan Kwon, Jae Hyuck Jang, Cheol Seong Hwang and Miyoung Kim
“Electron Energy-Loss Spectroscopy Analysis of HfO2 dielectric films on Strained and Relaxed epitaxial-SiGe/Si substrates”
Appl. Phys. Lett., 92, 232906 (2008) - Jun. (IF=3.495)