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작성일 : 12-05-15 20:09
Jiyoung Jang, Tae Joo Park, Jihwan Kwon, Jae Hyuck Jang, Cheol Seong Hwang and Miyoung Kim, “Electron Energy-Loss Spectroscopy Analysis of HfO2 dielectric films on Strained and Relaxed epitaxial-SiGe/Si substrates” Appl. Phys. Lett., 92, 232906 (2008)…
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   Electron energy-loss spectroscopy analysis of HfO2 dielectric films.pdf (529.7K) [12] DATE : 2012-05-22 20:51:21
Jiyoung Jang, Tae Joo Park, Jihwan Kwon, Jae Hyuck Jang, Cheol Seong Hwang and Miyoung Kim
 
“Electron Energy-Loss Spectroscopy Analysis of HfO2 dielectric films on Strained and Relaxed epitaxial-SiGe/Si substrates”
 
Appl. Phys. Lett., 92, 232906 (2008) - Jun.       (IF=3.495)