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작성일 : 12-05-15 20:08
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, and Cheol Seong Hwang, “Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films” Appl. Phys. Lett., 92, …
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   Effective_work_function_tunability_and_interfacial_reactions_with_underlying_HfO2_layer_of_plasma-enhanced_atomic_layer_deposited_TaCxNy_films.pdf (313.7K) [14] DATE : 2012-05-22 20:51:47
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, and Cheol Seong Hwang
 
“Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films”
 
Appl. Phys. Lett., 92, 202902 (2008) - May.       (IF=3.495)