Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, and Cheol Seong Hwang
“Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films”
Appl. Phys. Lett., 92, 202902 (2008) - May. (IF=3.495)