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작성일 : 12-05-15 20:08
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Minha Seo, and Cheol Seong Hwang,
 글쓴이 : 최고관리자
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   Effects_of_surface_treatments_using_O3_and_NH3_on_electrical_properties_and_chemical_structures_of_high-k_HfO2_dielectric_films_on_strained_Si18722.PDF (1.7M) [18] DATE : 2012-05-22 20:52:38
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Minha Seo, and Cheol Seong Hwang,
 
“Effects of surface treatments using O3 and NH3 on electrical properties and chemical structures of high-k HfO2 dielectric films on strained SixGe1-x substrates ”
 
J. Appl. Phys., 103, 084117 (2008) - Apr.       (IF=2.176)