Tae Joo Park, Jeong Hwan Kim, Kwang Duk Na and Cheol Seong Hwang
“Influence of phase separation by the post-deposition annealing on electrical properties of atomic layer deposited Hf-silicate films with various Si concentrations”
Electrochem. Solid St. Lett., 11 (5), H121-H123 (2008) - Mar. (IF=1.962)
작성일 : 12-05-15 20:08
조회 : 1,631
