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작성일 : 12-05-15 20:08
Kuan Yew Cheong, Jeong Hyun Moon, Tae Joo Park, Jeong Hwan Kim, Cheol Seong Hwang, Hyeong Joon Kim, Wook Bahng and Nam-Kyun Kim, “Improved Electronic Performance of HfO2/SiO2 Stacking Gate Dielectric on 4H SiC” IEEE Trans. Electron. Devices, 54 (12) 3…
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   Improved Electronic Performance of HfO2SiO2.pdf (680.8K) [11] DATE : 2012-05-22 20:55:03
Kuan Yew Cheong, Jeong Hyun Moon, Tae Joo Park, Jeong Hwan Kim, Cheol Seong Hwang, Hyeong Joon Kim, Wook Bahng and Nam-Kyun Kim
 
“Improved Electronic Performance of HfO2/SiO2 Stacking Gate Dielectric on 4H SiC”
 
IEEE Trans. Electron. Dev., 54 (12) 3409, (2007) - Dec.       (IF=2.620)