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작성일 : 12-05-15 20:08
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Cheol Seong Hwang, Jong Hoon Kim, Gee-Man Kim, Jae Ho Choi, Kang Joon Choi, and Jae Hak Jeong “Improved electrical performances of plasma-enhanced atomic layer deposited plasma enhanced atomic
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   Improved electrical performances of plasma-enhanced atomic layer.pdf (523.1K) [13] DATE : 2012-05-22 20:56:17
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Cheol Seong Hwang, Jong Hoon Kim, Gee-Man Kim, Jae Ho Choi, Kang Joon Choi, and Jae Hak Jeong
 
“Improved electrical performances of plasma-enhanced atomic layer deposited plasma enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma”
 
Appl. Phys. Lett., 91, 252106 (2007) - Dec.       (IF=3.495)