Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Cheol Seong Hwang, Jong Hoon Kim, Gee-Man Kim, Jae Ho Choi, Kang Joon Choi, and Jae Hak Jeong
“Improved electrical performances of plasma-enhanced atomic layer deposited plasma enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma”
Appl. Phys. Lett., 91, 252106 (2007) - Dec. (IF=3.495)