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작성일 : 12-05-15 20:08
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Minha Seo, and Cheol Seong Hwang, “Comparison of electrical properties between high-k HfO2 thin films on strained and relaxed Si1-xGex substrates after post-deposition annealing” Electrochem.…
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   Comparison of Electrical Properties Between HfO2 Films.pdf (547.0K) [14] DATE : 2012-05-22 20:56:48
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Minha Seo, and Cheol Seong Hwang
 
“Comparison of electrical properties between high-k HfO2 thin films on strained and relaxed Si1-xGex substrates after post-deposition annealing”
 
Electrochem. Solid St. Lett., 10(12) G97 (2007) - Oct.          (IF=1.962)