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작성일 : 12-05-15 20:07
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo, Kwang Duk Na, Cheol Seong Hwang "Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer" Microelectron. Eng., 84 2226–2229 (2007)-Sep
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Enhancement_in_thermal_stability_of_atomic_layer_deposited_HfO2_films_by_using_top_Hf_metal_layer.pdf (782.1K)
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DATE : 2012-05-22 20:57:19
Tae Joo Park
, Jeong Hwan Kim, Jae Hyuck Jang, MinhaSeo, KwangDuk Na, CheolSeong Hwang
"Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer"
Microelectron. Eng., 84 2226–2229 (2007) - Sep.
(IF=2.020)
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