Tae Joo Park, Jeong Hwan Kim, Min Ha Seo, Jae Hyuck Jang, and CheolSeongHwang
"Improvement of thermal stability and composition changes of atomic layer deposited HfO2 on Si by in situ O3 pretreatment"
Appl. Phys. Lett. 90, 152906 (2007) - Apr. (IF=3.495)