Publication > papers > Moonju Cho, Jaehoo Park, Hong Bae Park, Suk Woo Lee, Tae Joo Park, Cheol Seong Hwang, Gi Hoon Jang and Jaehack Jeong, “Comparison between atomic-layer-deposited HfO2 films using O3 or H2O oxidant and Hf[N(CH3)2] 4 precursor”, Appl. Phys. Lett., 85 (24

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작성일 : 12-05-15 20:05

Moonju Cho, Jaehoo Park, Hong Bae Park, Suk Woo Lee, Tae Joo Park, Cheol Seong Hwang, Gi Hoon Jang and Jaehack Jeong, “Comparison between atomic-layer-deposited HfO2 films using O3 or H2O oxidant and Hf[N(CH3)2] 4 precursor”, Appl. Phys. Lett., 85 (24…

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Comparison between atomic-layer-deposited HfO2 films using O3 or H2O.pdf (146.8K) [19] DATE : 2012-05-22 21:06:00

Moonju Cho, Jaehoo Park, Hong Bae Park, Suk Woo Lee, Tae Joo Park, Cheol Seong Hwang, Gi Hoon Jang and Jaehack Jeong

“Comparison between atomic-layer-deposited HfO2 films using O3 or H2O oxidant and Hf[N(CH3)2] 4 precursor”

Appl. Phys. Lett., 85 (24) 5953 (2004) - Dec. (IF=3.495)