Dae Hyun Kim, Han Jin Lee, Heonjong Jeong, Bonggeun Shong*, Woo-Hee Kim*, and Tae Joo Park*
"Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100°C using an Aminodisilane Precursor "
Chem. Mater., 31(15), 5502-5508 (2019) - Aug. *Corresponding author (IF=10.159)