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작성일 : 19-07-08 10:21
Dae Hyun Kim, Han Jin Lee, Heonjong Jeong, Bonggeun Shong*, Woo-Hee Kim*, and Tae Joo Park* "Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100°C using an Aminodisilane Precursor " Chem. Mater., 31(15), 5502-5508 (2019) - Au
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   acs.chemmater.9b01107.pdf (1.6M) [11] DATE : 2019-08-14 11:43:16
   https://doi.org/10.1021/acs.chemmater.9b01107 [30]

Dae Hyun Kim, Han Jin Lee, Heonjong Jeong, Bonggeun Shong*, Woo-Hee Kim*, and Tae Joo Park*


"Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100°C using an Aminodisilane Precursor "


Chem. Mater., 31(15), 5502-5508 (2019) - Aug.   *Corresponding author       (IF=10.159)