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작성일 : 19-03-28 16:05
Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim*, Tae Joo Park* "Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film" Adv. Electron. Mater., 5(3), 1800680, (2019) - Mar. *Corr
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   https://doi.org/10.1002/aelm.201800680 [704]
Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim*, Tae Joo Park* 

"Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film"

Adv. Electron. Mater., 5(3), 1800680, (2019) - Mar.   *Corresponding author       (IF=6.312)