Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim*, Tae Joo Park*
"Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film"
Adv. Electron. Mater., 5(3), 1800680, (2019) - Mar. *Corresponding author (IF=6.312)