HOME > Publication > Papers

 
작성일 : 19-03-28 16:05
Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim*, Tae Joo Park* "Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film" Adv. Electron. Mater., 5(3), 1800680, (2019) - Mar. *Corr
 글쓴이 : 최고관리자
조회 : 122  
   Jin_et_al-2019-Advanced_Electronic_Materials.pdf (3.4M) [31] DATE : 2019-03-28 16:05:22
   https://doi.org/10.1002/aelm.201800680 [35]
Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim*, Tae Joo Park* 

"Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film"

Adv. Electron. Mater., 5(3), 1800680, (2019) - Mar.   *Corresponding author       (IF=6.312)