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Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim* Tae Joo Park* "Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film" Adv. Electron. Mater., doi.org/10.1002/aelm.201800680, (201
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   https://doi.org/10.1002/aelm.201800680 [26]
Hyun Soo Jin, Dae Hyun Kim, Seong Keun Kim, Robert M. Wallace, Jiyoung Kim*, Tae Joo Park* 

"Strategic selection of oxygen source for low temperature-atomic layer deposition of Al2O3 thin film"

Adv. Electron. Mater., 1800680, doi.org/10.1002/aelm.201800680, (2018) - Dec.   *Corresponding author       (IF=5.466)