Tae Joo Park, Young-Chul Byun, Robert Wallace, and Jiyoung Kim*
"Impurity and silicate formation dependence on O3 pulse time and the growth temperature in atomic-layer-deposited La2O3 thin films"
J. Chem. Phys., 146(5), 052821, (2017) - Feb *Corresponding author (IF=2.843)