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Tae Joo Park, Young-Chul Byun, Robert Wallace, and Jiyoung Kim* "Impurity and silicate formation dependence on O3 pulse time and the growth temperature in atomic-layer-deposited La2O3 thin films" J. Chem. Phys., 146(5), 052821, (2017) - Feb *Correspon
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   http://aip.scitation.org/doi/full/10.1063/1.4975083 [252]
Tae Joo Park, Young-Chul Byun, Robert Wallace, and Jiyoung Kim* 

"Impurity and silicate formation dependence on O3 pulse time and the growth temperature in atomic-layer-deposited La2O3 thin films"

J. Chem. Phys., 146(5), 052821, (2017) - Feb   *Corresponding author       (IF=2.843)