Tae Joo Park*, Young Chol Byun, Robert M. Wallace, and Jiyoung Kim*
"Reduced impurities and improved electrical properties of atomic-layer-deposited HfO2 film grown at a low temperature (100 oC) by Al2O3 incorporation"
Appl. Surf. Sci., 371, 360-364, (2016) - May *Corresponding author (IF=4.439)