Seung Hyun Kim, Tae Jun Seok, Hyun Soo Jin, Woo-Byoung Kim*, and Tae Joo Park*
"Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation"
Appl. Surf. Sci., 356, 376-379, (2016) - Jan. *Corresponding author (IF=4.439)