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Seung Hyun Kim, Tae Jun Seok, Hyun Soo Jin, Woo-Byoung Kim*, and Tae Joo Park* "Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation" App. Surf. Sci
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   https://doi.org/10.1016/j.apsusc.2016.01.042 [713]
Seung Hyun Kim, Tae Jun Seok, Hyun Soo Jin, Woo-Byoung Kim*, and Tae Joo Park* 

"Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation" 

Appl. Surf. Sci., 356, 376-379, (2016) - Jan.   *Corresponding author       (IF=4.439)