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Min-Ji Ha, Na-Gyeong Kang, Woo-Hee Kim, Tae Joo Park, Tae-Eon Park, Ji-Hoon Ahn*"Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction" J. Vac. Sci. Technol. A 42, 042401 (2024) *Corresponding author (IF=2.4)
Soobin park, Inseong Hwang, Jae Chan Park, Tae Joo Park, Han-seung Lee, Sang Yeon Lee, Hyun-Min Yang, Bongyoung Yoo*"Fabrication of humidity monitoring sensor using porous silicon nitride structures for alkaline conditions" Sens.Actuator Rep., 2024, 100203 *Corresponding author (IF=5.9)
Gohar Ali, Ijaz Ali, Mohsin Ali Marwat, Junaid Khan, Muhammad Abdul Basit* and Tae Joo Park*"Template-free hierarchical TiO2/rGO nanocomposites for enhanced photocatalytic performance"Chem. Phys. Lett, 2024, 848, 141372 *Corresponding author (IF= 2.8)
Hong Keun Chung, Jihoon Jeon, Han Kim, Myungsu Jang, Sung-Chul Kim, Sung Ok Won, Yoon Jang Chung, Jeong Hwan Han, Sung Haeng Cho, Tae Joo Park, Seong Keun Kim*"Low Temperature Crystallization of Atomic-Layer-Deposited SrTiO3 Films with an Extremely Low Equivalent Oxide Thickness of Sub-0.4 nm"Appl. Surf. Sci., 664, 15, 160243 (2024) *Corresponding author (IF=6.7)
Seunghyeok Lee, Gwang Min Park, Younghoon Kim, So-Hyeon Lee, Sung-Jin Jung, Junpyo Hong, Sung-Chul Kim, Sung Ok Won, Albert Lee, Yoon Jang Chung, Ju-Young Kim, Heesuk Kim, Seung-Hyub Baek, Jin-Sang Kim, Tae Joo Park, Seong Keun Kim*"Unlocking the Potential of Porous Bi2te3-Based Thermoelectrics Using Precise Interface Engineering Through Atomic Layer Deposition"ACS Appl. Mater. Interfaces., 16, 14, 17683-17691 (2024) *Corresponding author (IF=9.5)
Hyobin Eom, Woojin Bae, Ju Young Sung, Ji Hyeon Choi, Jae Hyuck Jang, Tae Joo Park, Sang Woon Lee, Bonggeun Shong*"Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminum"APL Mater. 12, 031115 (2024) *Corresponding author (IF=6.1)
Nhat-Minh Phung, Si-Young Bae, Soonil Lee, Tae-Joo Park, Se-Hun Kwon, Minh-Tan Ha, and Seong-Min Jeong*"Towards modeling of ZrO2 Atomic Layer Deposition at reactor scale based on experimental kinetic approximation"Appl. Surf. Sci., 646 (2024), 158840  *Corresponding author (IF=6.7)
Waseem Sardar*, Gohar Ali, Fengchun Jiang, Ahmad Nawaz, Salman Khan, Muhammad Zubair, Dawar Awan, Mahmood Iqbal and Tae Joo Park *"Systematically Designed g-C3N4/rGO/MoS2 Nanocomposite for Enhanced Photocatalytic Performance"Curr Appl Phys., 57, 42-48 (2024)  *Corresponding author (IF=2.4)
Suyeon Kim, Seung-Hun Lee, In Ho Jo, Tae Joo Park*, Jeong Hwan Kim*"Reduced leakage current in Atomic-layer-deposited HfO2 thin films deposited at Low temperature by In-situ Defect Passivation"Appl Surf Sci., 645, 1, 158790 (2024)  *Corresponding author (IF=6.7)
Syed Jazib Abbas Zaidi, Summal Zoha, Muneeb Ahmad, Muhammad Shahid, Tae Joo Park* and Muhammad Abdu Basit*" Physicochemically tailored Ag2S QDs deposition on ZnO for improved photocatalytic and antibacterial performance"Mater. Today Commun.,37, 107016 (2023) *Corresponding author (IF = 3.8)
Gohar Ali, Waheed Ahmad, Navaj Mullani, Muhammad Abdul Basit* and Tae Joo Park"Contrasting photocatalytic performance of quantum-dot sensitized p-type and n-type TiO2 hierarchical nanocomposites under visible light"Mater. Chem. Phys.,308, 128233 (2023) *Corresponding author (IF= 4.6)
Hong Keun Chung, Han Kim, Ji Hoon Jeon, Sung Chul Kim, Sung Ok Won, Ryosuke Harada, Tomohiro Tsugawa, Yoon Jang Chung, Seung Hyub Baek, Tae Joo Park, Seong Keun Kim*"Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition"J. Phys. Chem. Lett., 2023, 14, 28, 6486-6493 *Corresponding author (IF= 5.7)
*Cover Paper     Syed Jazib Abbas Zaidi, Jae Chan Park, Ji Won Han, Ji Hyeon Choi, Muhammad Aanish Ali, Muhammad Abdul Basit, and Tae Joo Park*"Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges"Small Science, 230060 (2023) *Corresponding author (IF= 12.7)
Seo Young Jang, Hye Min Lee, Ju Young Sung, Se Eun Kim, Jae Deock Jeon, Yewon Yun, Sang Mo Moon, Joung Eun Yoo, Ji Hyeon Choi, Tae Joo Park, and Sang Woon Lee*"Epitaxial growth of NbN thin films for electrodes using atomic layer deposition"Appl. Surf. Sci. 2023, 157824  *Corresponding author (IF=7.392)
*Cover Paper     Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Ji-Hoon Ahn, Woo-Hee Kim*, and Tae Joo Park* "High-quality SiNx thin film growth at 300 ℃ using atomic layer deposition with hollow cathode plasma" J. Mater. Chem. C., 2023, 11, 9107-9113 *Corresponding author (IF=8.067)
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